The first photomask processing center in Asia

Pixer Technology Ltd (not Pixar Animation Studio), an Israel-based semiconductor manufacturer, is going to open their photomask (A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern) processing center in Taiwan in May; also the first in Asia. This center will serve company’s asian pacific customers. With this center which being build in a partnership with Marketech International Corp, Pixer want to shorten their lead time from seven to two days.

Image: Example of Mask Application with the Pixer CDC200

EETimes said that:

The processing center will use Pixer’s latest CDC200 tool, which is claimed to enable both mask makers and IC manufacturers to control their Critical Dimensions and significantly improve CD uniformity across masks and wafers. Pixer says that its process, utilizing the CDC200, is enabling the ITRS Roadmap CD uniformity requirements for 45nm and 32nm process nodes. Pixer’s Shade-in Element technology uses femto second laser source and enables insertion of optical elements into clear media. The company says it holds multiple patents. The CDC200 introduces shading elements into the mask, which affect the mask attenuation in a way which translates into change in CD on the wafer. According to Pixer, by measuring the CD dimension before the correction, and by applying a relevant correction, the right attenuation is achieved, that shifts the wafer CD to its correct value.

Source: EETimes and Pixer Technology